Placement measurement and FE modeling results for distortion control of stencil masks

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Title	Placement measurement and FE modeling results for distortion control of stencil masks
Author	Ehrmann A.
Co-authors	Kaesmaier R.
	Kragler K.
	Struck T.
	Haugender E.
	Loschner H.
	Lutz J.
	Butschke J.
	Letzkus F.
	Springer R.
	Držík Milan SAVSTAV - Ústav stavebníctva a architektúry SAV
	Hrkút Pavol 1948- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID
	Hudek Peter 1953- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Degen A.
	Shi F.
	Volland B.
	Sossna E.
	Rangelow I.W.
	Engelstad R.L.

Source document	19th Annual BACUS Symposium on Photomask Technology and Management : Proceedings. - CA, USA, 1999
Language	eng - English
Country	US - United States of America
Document kind	rozpis článkov z periodík (rzb)
Category	AFC - Published papers from foreign scientific conferences
Year	1999
Registered in	WOS
Registered in	SCOPUS

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Number of the records: 1