Minimum ion bean exposure dose determination for chemically amplified resist from printed dot matrices

Number of the records: 1

Title	Minimum ion bean exposure dose determination for chemically amplified resist from printed dot matrices
Author	Bruenger W.H.
Co-authors	Torkler M.
	Weiss M.
	Loeschner Hans
	Leung K.
	Lee Y.
	Hudek Peter 1953- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Rangelow I.W.
	Stangl Guenther
	Fallmann W.

Source document	Journal of Vacuum Science and Technology B. Vol. 17, no. 6 (1999), p. 3119-3121
Language	eng - English
Country	US - United States of America
Document kind	rozpis článkov z periodík (rbx)
Citations	DEVOLDER, T - CHAPPERT, C - BERNAS, H. Theoretical study of magnetic pattern replication by He+ ion irradiation through stencil masks. In JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS. ISSN 0304-8853, 2002, vol. 249, no. 3, pp. 452-457.
	FASSBENDER, J - RAVELOSONA, D - SAMSON, Y. Tailoring magnetism by light-ion irradiation. In JOURNAL OF PHYSICS D-APPLIED PHYSICS. ISSN 0022-3727, 2004, vol. 37, no. 16, pp. R179-R196.
Category	ADC
Year	1999

article

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
1999	1998	1.662

Number of the records: 1