Experimental results of the stochastic coulomb interaction in ion projection lithography.

Number of the records: 1

Title	Experimental results of the stochastic coulomb interaction in ion projection lithography.
Author	Jager W.H.
Co-authors	Derksen G.
	Mertens B.
	Cekan E.
	Lammer G.
	Vonach H.
	Buschbeck H.
	Zeininger M.
	Horner C.
	Loeschner Hans
	Stengl G.
	Bleeker A.
	Benschop J.
	Shi F.
	Volland B.
	Hudek Peter 1953- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Heerlein H.
	Rangelow I.W.
	Kaesmaier R.

Source document	Journal of Vacuum Science Technology B. Vol. 17, no. 6 (1999), p. 3099-3106
Language	eng - English
Country	US - United States of America
Document kind	rozpis článkov z periodík (rbx)
Citations	GOLLADAY, SD - PFEIFFER, HC - ROCKROHR, JD - STICKEL, W. PREVAIL Alpha system: Status and design considerations. In JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. ISSN 1071-1023, 2000, vol. 18, no. 6, pp. 3072-3078.
	JIANG, X. Resolution improvement and pattern generator development for the maskless micro-ion-beam reduction lithography system. PHD Thesis, University of California, Berkeley. 2006, 184 p.
	KRUIT, Pieter - JANSEN, Guus H. Space charge and statistical coulomb effects. In Handbook of Charged Particle Optics, Second Edition, 2017-12-19, pp. 341-389.
	XU, Yuan - WANG, Changyu - WANG, Yongtian - LIU, Juan. Review of Design Methods of Diffractive Optical Element. In Guangxue Xuebao/Acta Optica Sinica, 2023-04-01, 43, 8, pp. ISSN 02532239. Dostupné na: https://doi.org/10.3788/AOS230557.
Category	ADC
Year	1999
Registered in	WOS
Registered in	SCOPUS
Registered in	CCC

article

rok	CC	IF	IF Q (best)	JCR Av Jour IF Perc	SJR	SJR Q (best)	CiteScore
	A

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
1999	1998	1.662

Number of the records: 1