Process optimization and diffusion lenght evaluation of a new aqueous base developable negative epoxy electron beam resist

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Title	Process optimization and diffusion lenght evaluation of a new aqueous base developable negative epoxy electron beam resist
Author	Glezos N.
Co-authors	Argitis P.
	Velossiotis D.
	Raptis I.
	Hudek Peter 1953- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID

Source document	ASDAM 2000 : 3rd International EuroConference on Advanced Semiconductor Devices and Microsystems. P. 231-234 / Osvald Jozef 1953 ; Haščík Štefan 1956 ; Kuzmík Ján 1960 ; Breza J.. - Piscataway : IEEE, 2000
Language	eng - English
Country	US - United States of America
Document kind	rozpis článkov z periodík (rzb)
Category	AFC - Published papers from foreign scientific conferences
Year	2000

article

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
2000

Number of the records: 1