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Process optimization and diffusion lenght evaluation of a new aqueous base developable negative epoxy electron beam resist
Title Process optimization and diffusion lenght evaluation of a new aqueous base developable negative epoxy electron beam resist Author Glezos N. Co-authors Argitis P. Velossiotis D. Raptis I. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Source document ASDAM 2000 : 3rd International EuroConference on Advanced Semiconductor Devices and Microsystems. P. 231-234 / Osvald Jozef 1953 ; Haščík Štefan 1956 ; Kuzmík Ján 1960 ; Breza J.. - Piscataway : IEEE, 2000 Language eng - English Country US - United States of America Document kind rozpis článkov z periodík (rzb) Category AFC - Published papers from foreign scientific conferences Year 2000 article
rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2000
Number of the records: 1