Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment

Number of the records: 1

Title	Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment
Author	Volland B.
Co-authors	Shi F.
	Heerlein H.
	Rangelow I.W.
	Hudek Peter 1953- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Cekan E.
	Vonach H.
	Loeschner Hans
	Horner C.
	Stengl G.
	Buschbeck H.
	Zeininger M.
	Bleeker A.
	Benschop J.

Source document	Journal of Vacuum Science and Technology B. Vol. 18, no. 6 (2000), p. 3202-3206
Language	eng - English
Country	US - United States of America
Document kind	rozpis článkov z periodík (rbx)
Citations	SOHDA, Y - OHTA, H - SAITOU, N. A method for evaluating aberration in the crossover image in mask irradiation optics of electron beam. In REVIEW OF SCIENTIFIC INSTRUMENTS. ISSN 0034-6748, 2002, vol. 73, no. 2, pp. 270.
	KASSING, Rainer. Semiconductor. In FESTKORPER, 2005, vol., no., pp. 543.
	TSENG, AA. Recent developments in nanofabrication using ion projection lithography. In SMALL. ISSN 1613-6810, 2005, vol. 1, no. 6, pp. 594.
	TSENG, Ampere A. - DU, Zuliang - NOTARGIACOMO, Andrea - JOU, Shyankay. Nanoscale fabrication. In Microsystems and Nanotechnology, 2012-08-01, 9783642182938, pp. 513-577.
Category	ADC
Year	2000
Registered in	WOS
Registered in	SCOPUS
Registered in	CCC
DOI	10.1116/1.1319688

article

rok	CC	IF	IF Q (best)	JCR Av Jour IF Perc	SJR	SJR Q (best)	CiteScore
	A

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
2000	1999	1.690

Number of the records: 1