Number of the records: 1
Field emission cathode array with self aligned gate electrode fabricated by silicon micromachining
Title Field emission cathode array with self aligned gate electrode fabricated by silicon micromachining Author Barth W. Co-authors Debski T. Shi F. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Biehl S. Iwert P. Grabiec P.B. Studzinska K. Mitura S. Bekh I. Lushkin A. Il`chenko L. Il`chenko V. Haindl G. Rangelow I.W. Source document Journal of Vacuum Science and Technology B. Vol. 18, no. 6 (2000), p. 3544-3548 Language eng - English Document kind rozpis článkov z periodík (rbx) Citations CHANG, THP - MANKOS, M - LEE, KY - MURAY, LP. Multiple electron-beam lithography. In MICROELECTRONIC ENGINEERING. ISSN 0167-9317, 2001, vol. 57-8, no., pp. 117-135. CHO, B. - ISHIKAWA, T. - OSHIMA, C. Coherent and intense multibeam generation by the apex of sharp nano-objects: Electron half-circular prism. In APPLIED PHYSICS LETTERS. ISSN 0003-6951, 2007, vol. 91, no. 16, pp. BURT, D. P. - DOBSON, P. S. - DONALDSON, L. - WEAVER, J. M. R. A simple method for high yield fabrication of sharp silicon tips. In MICROELECTRONIC ENGINEERING. ISSN 0167-9317, 2008, vol. 85, no. 3, pp. 625-630. Category ADC Year 2000 Registered in WOS Registered in SCOPUS Registered in CCC DOI 10.1116/1.1324648 article
rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2000 1999 1.690
Number of the records: 1