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Aqueous base development and acid diffusion length optimization in negative epoxy resist for electron beam lithography
Title Aqueous base development and acid diffusion length optimization in negative epoxy resist for electron beam lithography Author Glezos N. Co-authors Argitis P. Velossiotis D. Raptis I. Hatzakis M. Hudek Peter 1953- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Source document Journal of Vacuum Science and Technology B. Vol. 18, no. 6 (2000), p. 3441-3434 Language eng - English Document kind rozpis článkov z periodík (rbx) Citations PATSIS, GP - GOGOLIDES, E. Simulation of surface and line-edge roughness formation in resists. In MICROELECTRONIC ENGINEERING. ISSN 0167-9317, 2001, vol. 57-8, no., pp. 563-569. RAPTIS, I. Resist lithographic performance enhancement based on solvent removal measurements by optical interferometry. In JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS. ISSN 0021-4922, 2001, vol. 40, no. 9A, pp. 5310-5311. JEYAKUMAR, A - HENDERSON, CL - ROMAN, P - SUH, S. Electron beam lithography process using radiation sensitive carboxylate metalorganic precursors. In JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. ISSN 1071-1023, 2003, vol. 21, no. 6, pp. 3157-3161. AKTARY, M - JENSEN, MO - WESTRA, KL - BRETT, MJ - FREEMAN, MR. High-resolution pattern generation using the epoxy novolak SU-8 2000 resist by electron beam lithography. In JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. ISSN 1071-1023, 2003, vol. 21, no. 4, pp. L5-L7. PATSIS, GP - GLEZOS, N - GOGOLIDES, E. Monte Carlo simulation of gel formation and surface and line-edge roughness in negative tone chemically amplified resists. In JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. ISSN 1071-1023, 2003, vol. 21, no. 1, pp. 254-266. SARKAR, Mihir - MOHAPATRA, Y. N. Electron beam lithography in thick negative tone chemically amplified resist: Controlling sidewall profile in deep trenches and channels. In MICROELECTRONIC ENGINEERING. ISSN 0167-9317, 2014, vol. 130, no., pp. 1-7. TAN, Y.S. - WANG, H. - WANG, H. - PAN, C. - YANG, J. K. High-throughput fabrication of large-scale metasurfaces using electron-beam lithography with SU-8 gratings for multilevel security printing. In Photonics Research. 2023, vol. 11, no. 3, pp. B103-B110. Dostupné na: https://doi.org/10.1364/PRJ.472212. Category ADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted) Year 2000 Registered in WOS Registered in SCOPUS Registered in CCC DOI 10.1116/1.1324615 
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rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2000 1999 1.690
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