35uM thick high-resolution silicon stencil mask: Fabrication and operation in high energy ion projection and 10xdemagnification ion projection lithography

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Title	35uM thick high-resolution silicon stencil mask: Fabrication and operation in high energy ion projection and 10xdemagnification ion projection lithography
Author	Rangelow I.W.
Co-authors	Sossna E.
	Volland B.
	Shi F.
	Meijer J.
	Stephan A.
	Weidenmuller U.
	Bukow H.H.
	Rolfs C.
	Ngo Vinh Van
	Leung K.N.
	Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Matay Ladislav 1950- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID

Source document	The 45th International Conference on Electron, Ion and Photo Beam Technology and Nanofabrication : EIPBN 2001. Abstracts. P. 96-97. - Washington, DC, USA, 2001
Language	eng - English
Country	US - United States of America
Document kind	rozpis článkov z periodík (rzb)
Category	AFG - Abstracts of papers from foreign conferences
Year	2001

article

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
2001

Number of the records: 1