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Low temperature plasma deposition of N-doped a-SiC:H films and annealed by pulsed electron beam

  1. TitleLow temperature plasma deposition of N-doped a-SiC:H films and annealed by pulsed electron beam
    Author 1955 Huran Jozef SAVELEK - Elektrotechnický ústav SAV    ORCID
    Co-authors Hotový I.

    Kobzev A.P.

    Balalykin Nikolay I.

    Source document . P. 401 Proceedings of the 16th International Symposium on Plasma Chemistry. - Taormina, 2003
    Languageeng - English
    CountryIT - Italy
    Document kindrozpis článkov z periodík (rzb)
    CitationsCHOUKOUROV, A. - GRINEVICH, A. - HANUS, J. - KOUSAL, J. - SLAVINSKA, D. - BIEDERMAN, H. - BOWERS, A. - HANLEY, L. In THIN SOLID FILMS. APR 28 2006, vol. 502, no. 1-2, p. 40-43.
    CategoryAEE - Scientific papers in foreign non peer-reviewed proceedings, monographs
    Category of document (from 2022)O2 - Odborný výstup publikačnej činnosti ako časť knižnej publikácie alebo zborníka
    Type of documentpríspevok
    Year2003
    article

    article

    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    2003
Number of the records: 1  

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