Chemically amplified deep UV resist for micromachining using electron beam lithography and dry etching

Number of the records: 1

Title	Chemically amplified deep UV resist for micromachining using electron beam lithography and dry etching
Author	Hudek Peter 1953- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
Co-authors	Rangelow I.W.
	Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Stangl Guenther
	Grabiec P.B.
	Belov Miroslav
	Shi F.

Co-authors	Rangelow E.W.
Source document	Sensors and Materials. Vol. 10, no. 4 (1998) p. 219-227
Language	eng - English
Document kind	rozpis článkov z periodík (rbx)
Citations	SON, Sang Uk - CHOI, Yo Han - LEE, Seung S. An efficient cell count method using a lattice molded on indents of a culture dish. In SENSORS AND ACTUATORS A-PHYSICAL. ISSN 0924-4247, 2008, vol. 147, no. 2, pp. 665-671.
Category	ADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted)
Category of document (from 2022)	V3 - Vedecký výstup publikačnej činnosti z časopisu
Type of document	článok
Year	1998
Registered in	WOS
Registered in	SCOPUS

article

rok	CC	IF	IF Q (best)	JCR Av Jour IF Perc	SJR	SJR Q (best)	CiteScore
	A

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
1998

Number of the records: 1