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Study of Si implantation into Mg-doped GaN for MOSFETs

  1. TitleStudy of Si implantation into Mg-doped GaN for MOSFETs
    Author Ostermaier C.
    Co-authors Ahn S.-I.

    Potzger K.

    Helm M.

    Kuzmík Ján 1960 SAVELEK - Elektrotechnický ústav SAV    ORCID

    Pogany D.

    Strasser G.

    Lee J.-H.

    Hahm S.-H.

    Lee Jung-Hee

    Source document Physica status solidi C. Vol. 7, (2010), p. 1964-1966
    Languageeng - English
    Document kindrozpis článkov z periodík (rbx)
    CitationsZHANG, Y.H. - LIU, Z.H. - TADJER, M.J. - SUN, M. - PIEDRA, D. - HATEM, C. - ANDERSON, T.J. - LUNA, L.E. - NATH, A. - KOEHLER, A.D. - OKUMURA, H. - HU, J. - ZHANG, X. - GAO, X. - FEIGELSON, B.N. - HOBART, K.D. - PALACIOS, T. In IEEE ELECTRON DEVICE LETTERS. AUG 2017, vol. 38, no. 8, p. 1097-1100.
    LORENZ, K. Ion Implantation into Nonconventional GaN Structures. In PHYSICS. ISSN 2624-8174, JUN 2022, vol. 4, no. 2, p. 548-564. Dostupné na: https://doi.org/10.3390/physics4020036.
    CategoryADEB - Scientific papers in other foreign journals not registered in Current Contents Connect without IF (non-impacted)
    Category of document (from 2022)V3 - Vedecký výstup publikačnej činnosti z časopisu
    Type of documentčlánok
    Year2010
    Registered inWOS
    Registered inSCOPUS
    DOI 10.1002/pssc.200983534
    article

    article

    rokCCIFIF Q (best)JCR Av Jour IF PercSJRSJR Q (best)CiteScore
    N
    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    201020090.428Q3
Number of the records: 1  

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