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Computer simulation of resist profiles at electron beam nanolithography
Title Computer simulation of resist profiles at electron beam nanolithography Author Vutova Katia Co-authors Koleva Elena Mladenov Georgy Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Tanaka T. Source document Microelectronic Engineering : an international journal of semiconductor manufacturing technology. Vol. 87, (2010), p. 1108-1111 Language eng - English Country NL - Netherlands Document kind rozpis článkov z periodík (rbx) Citations ZHANG, Hui - KOMORI, Takuya - ZHANG, Yulong - YIN, You - HOSAKA, Sumio. Simulation of Fine Resist Profile Formation by Electron Beam Drawing and Development with Solubility Rate Based on Energy Deposition Distribution. In JAPANESE JOURNAL OF APPLIED PHYSICS. ISSN 0021-4922, 2013, vol. 52, no. 12, pp. ZHANG, Hui - HUDA, Miftakhul - KOMORI, Takuya - ZHANG, Yulong - YIN, You - HOSAKA, Sumio. Estimation of pattern resolution using NaCl high-contrast developer by Monte Carlo simulation of electron beam lithography. In MICROELECTRONIC ENGINEERING. ISSN 0167-9317, 2014, vol. 121, no., pp. 142-146. RYGER, Ivan - VANKO, Gabriel - LALINSKY, Tibor - HASCIK, Stefan - BENCUROVA, Anna - NEMEC, Pavol - ANDOK, Robert - TOMASKA, Martin. GaN/SiC based surface acoustic wave structures for hydrogen sensors with enhanced sensitivity. In SENSORS AND ACTUATORS A-PHYSICAL. ISSN 0924-4247, 2015, vol. 227, no., pp. 55-62. Category ADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2010 Registered in WOS Registered in SCOPUS Registered in CCC DOI 10.1016/j.mee.2009.11.045 
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rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2010 2009 1.488 Q2 0.834 Q1
Number of the records: 1