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Role of the gate-to-drain distance in the performance of the normally-off InAlN/GaN HEMTs

  1. TitleRole of the gate-to-drain distance in the performance of the normally-off InAlN/GaN HEMTs
    Author Kuzmík Ján 1960 SAVELEK - Elektrotechnický ústav SAV    ORCID
    Co-authors Ostermaier C.

    Pozzovivo G.

    Basnar B.

    Schrenk W.

    Carlin J.-F.

    Gonschorek M.

    Feltin E.

    Grandjean N.

    Douvry Y.

    Gaquire Ch.

    De Jaeger J.-C.

    Strasser G.

    Pogany D.

    Gornik E.

    Source document ASDAM 2010 : proceedings of the 8th International Conference on Advanced Semiconductor Devices and Microsystems. P. 163-166. - Piscataway : IEEE, 2010 / Breza J. ; Donoval D. ; Vavrinský E.
    Languageeng - English
    Document kindrozpis článkov z periodík (rzb)
    CategoryAEC - Scientific papers in foreign peer-reviewed proceedings, monographs
    Category of document (from 2022)V2 - Vedecký výstup publikačnej činnosti ako časť editovanej knihy alebo zborníka
    Type of documentpríspevok
    Year2010
    article

    article

    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    2010
Number of the records: 1  

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