Atomic layer deposition of high-k oxides on InAlN/GaN-based materials

Number of the records: 1

Title	Atomic layer deposition of high-k oxides on InAlN/GaN-based materials
Author	Abermann S.
Co-authors	Ostermaier C.
	Pozzovivo G.
	Kuzmík Ján 1960 SAVELEK - Elektrotechnický ústav SAV ^ORCID
	Bethge O.
	Henkel C.
	Strasser G.
	Pogany D.
	Giesen C.
	Heuken M.
	Kohn E.
	Alomari M.
	Bertagnolli E.

Source document	ECS Transactions. Vol. 25, (2009), p. 123-129
Language	eng - English
Document kind	rozpis článkov z periodík (rbx)
Category	ADEB - Scientific papers in other foreign journals not registered in Current Contents Connect without IF (non-impacted)
Category of document (from 2022)	V3 - Vedecký výstup publikačnej činnosti z časopisu
Type of document	článok
Year	2010

article

rok	CC	IF	IF Q (best)	JCR Av Jour IF Perc	SJR	SJR Q (best)	CiteScore
	N

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
2009	2008			0.254	Q2

Number of the records: 1