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Investigation of the high sensitive negative resist for the photomasks fabrication by e-beam lithography
Title Investigation of the high sensitive negative resist for the photomasks fabrication by e-beam lithography Author Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV SCOPUS RID Co-authors Barák Vladislav 1948- SAVINFO - Ústav informatiky SAV SCOPUS RID Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Nemec Pavol 1975- SAVINFO - Ústav informatiky SAV SCOPUS RID Ritomský Adrian 1956- SAVINFO - Ústav informatiky SAV SCOPUS RID Source document Elektrotechnica & elektronica E+E. Vol. 47 (2012) no. 5-6, p. 5-9 Language eng - English Country BG - Bulgaria Document kind rozpis článkov z periodík (rbx) Category ADEB - Scientific papers in other foreign journals not registered in Current Contents Connect without IF (non-impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2012 article
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