Investigation of the high sensitive negative resist for the photomasks fabrication by e-beam lithography

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Title	Investigation of the high sensitive negative resist for the photomasks fabrication by e-beam lithography
Author	Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID
Co-authors	Barák Vladislav 1948- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID
	Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID
	Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Nemec Pavol 1975- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID
	Ritomský Adrian 1956- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID

Source document	Elektrotechnica & elektronica E+E. Vol. 47 (2012) no. 5-6, p. 5-9
Language	eng - English
Country	BG - Bulgaria
Document kind	rozpis článkov z periodík (rbx)
Category	ADEB - Scientific papers in other foreign journals not registered in Current Contents Connect without IF (non-impacted)
Category of document (from 2022)	V3 - Vedecký výstup publikačnej činnosti z časopisu
Type of document	článok
Year	2012

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rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
2012

Number of the records: 1