Influence of backscattered electrons on the quality of structures in the thin resist layer patterned using e-beam with the Gaussian distribution of electron energies

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Title	Influence of backscattered electrons on the quality of structures in the thin resist layer patterned using e-beam with the Gaussian distribution of electron energies
Author	Ďurina P.
Co-authors	Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID
	Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID
	Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Kúš P.
	Pleceník A.

Source document	/ Vajda J. ; Jamnický I. APCOM 2012 : proceedings on Applied Physics of Condensed Matter of the 18th International Conference. P. 161-164. - Bratislava : Slovenská technická univerzita v Bratislave, 2012 ; International Conference on Applied Physics of Condensed Matter APCOM 2012
Language	eng - English
Country	SK - Slovak Republic
Document kind	rozpis článkov z periodík (rzb)
Category	AFDA - Published papers from international scientific conferences in Slovakia
Year	2012

article

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
2012

Number of the records: 1