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Electrical and optical characterization of Ni/Al0,3Ga0,7N/GaN Schottky barrier diodes

  1. TitleElectrical and optical characterization of Ni/Al0,3Ga0,7N/GaN Schottky barrier diodes
    Author Kordoš Peter SAVELEK - Elektrotechnický ústav SAV
    Co-authors Škriniarová Jaroslava

    Chvála A.

    Florovič M.

    Kováč Jaroslav

    Donoval D.

    Source document Journal of Electronics Materials. Vol. 41 (2012), p. 3017-3020
    Languageeng - English
    Document kindrozpis článkov z periodík (rbx)
    CitationsGASSOUMI, M. - MOSBAHI, H. - SOLTANI, A. - SBRUGNERA-AVRAMOVIC, V. - ZAIDI, M.A. - GAQUIERE, C. - MEJRI, H. - MAAREF, H. In MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. DEC 2013, vol. 16, no. 6, p. 1775-1778.
    SHARMIN, S. - MURAKI, K. - FUJISAWA, T. In JAPANESE JOURNAL OF APPLIED PHYSICS. NOV 2013, vol. 52, no. 11, 1.
    NAKAMURA, A. - SUGIYAMA, M. - FUJII, K. - NAKANO, Y. In JAPANESE JOURNAL OF APPLIED PHYSICS. AUG 2013, vol. 52, no. 8, 2, SI.
    TURUT, Abdulmecit - KARABULUT, Abdulkerim - EFEOGLU, Hasan. Effect of the Al2O3 interfacial layer thickness on the measurement temperature-induced I-V characteristics in Au/Ti/Al2O3/n-GaAs structures. In JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS. ISSN 0957-4522, 2021, vol. 32, no. 17, pp. 22680-22688. Dostupné na: https://doi.org/10.1007/s10854-021-06753-1.
    CategoryADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted)
    Category of document (from 2022)V3 - Vedecký výstup publikačnej činnosti z časopisu
    Type of documentčlánok
    Year2012
    Registered inWOS
    Registered inSCOPUS
    Registered inCCC
    DOI 10.1007/s11664-012-2184-5
    article

    article

    rokCCIFIF Q (best)JCR Av Jour IF PercSJRSJR Q (best)CiteScore
    A
    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    201220111.466Q20.844Q1
Number of the records: 1  

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