Oblique angle sputtering of ZnO: Ga thin films

Number of the records: 1

Title	Oblique angle sputtering of ZnO: Ga thin films
Author	Tvarožek V.
Co-authors	Novotný I.
	Šutta P.
	Netrvalová M.
	Vávra Ivo 1949 SAVELEK - Elektrotechnický ústav SAV
	Bruncko J.
	Gašpierik P.
	Flickyngerová S.

Source document	Physics Procedia. Vol. 32, (2012), p. 456-463
Language	eng - English
Document kind	rozpis článkov z periodík (rbx)
Citations	YANG, Z.P. - XIE, Z.H. - LIN, C.C. - LEE, Y.J. In OPTICAL MATERIALS EXPRESS. FEB 1 2015, vol. 5, no. 2, p. 399-407.
	FERNANDEZ, S. - GRANDAL, J. - TRAMPERT, A. - NARANJO, F.B. In MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. JUN 2017, vol. 63, p. 115-121.
	ANH TUAN THANH PHAM - OANH KIEU TRUONG LE - DUNG VAN HOANG - TRUONG HUU NGUYEN - TRANG HUYEN CAO PHAM - PHUONG THANH NGOC VO - THANG BACH PHAN - VINH CAO TRAN. Controlling thickness to tune performance of high-mobility transparent conducting films deposited from Ga-doped ZnO ceramic target. In JOURNAL OF THE EUROPEAN CERAMIC SOCIETY. ISSN 0955-2219, 2021, vol. 41, no. 6, pp. 3493-3500. Dostupné na: https://doi.org/10.1016/j.jeurceramsoc.2021.01.029.
Category	ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus
Category of document (from 2022)	V3 - Vedecký výstup publikačnej činnosti z časopisu
Type of document	článok
Year	2012
Registered in	WOS
Registered in	SCOPUS
DOI	10.1109/ASDAM.2012.6418515

article

rok	CC	IF	IF Q (best)	JCR Av Jour IF Perc	SJR	SJR Q (best)	CiteScore
	N

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
2012	2011			0.227

Number of the records: 1