Number of the records: 1
Photosensitive AZ 5214E resist used for e-beam lithography applications
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rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2013
Number of the records: 1
Slovenská akadémia vied
Slovenská akadémia vied
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| rok vydania | rok metriky | IF | IF Q (best) | SJR | SJR Q (best) |
|---|---|---|---|---|---|
| 2013 |