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Photosensitive AZ 5214E resist used for e-beam lithography applications
Title Photosensitive AZ 5214E resist used for e-beam lithography applications Author Andok Robert 1973- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Co-authors Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV SCOPUS RID Nemec Pavol 1975- SAVINFO - Ústav informatiky SAV SCOPUS RID Hrkút Pavol 1948- SAVINFO - Ústav informatiky SAV SCOPUS RID Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID Škriniarová Jaroslava Haščík Štefan 1956 SAVELEK - Elektrotechnický ústav SAV Source document / Vajda J. ; Jamnický I. Proceedings of the 19th International Conference on Applied Physics of Condensed Matter : APCOM 2013. P. 50-53. - Bratislava : Nakladateľstvo STU Bratislava, 2013 ; International Conference on Applied Physics of Condensed Matter APCOM 2013 Language eng - English Country SK - Slovak Republic Document kind rozpis článkov z periodík (rzb) Category AFD - Published papers from domestic scientific conferences Year 2013 
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rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2013
Number of the records: 1