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Suitability of N2 plasma for the RIE etching of thin Ag layers

  1. TitleSuitability of N2 plasma for the RIE etching of thin Ag layers
    Author Hrkút Pavol 1948- SAVINFO - Ústav informatiky SAV    SCOPUS    RID
    Co-authors Haščík Štefan 1956 SAVELEK - Elektrotechnický ústav SAV

    Matay Ladislav 1950- SAVINFO - Ústav informatiky SAV    SCOPUS    RID

    Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV    SCOPUS    RID    ORCID

    Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV    SCOPUS    RID

    Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV    SCOPUS    RID

    Nemec Pavol 1975- SAVINFO - Ústav informatiky SAV    SCOPUS    RID

    Andok Robert 1973- SAVINFO - Ústav informatiky SAV    SCOPUS    RID    ORCID

    Source document / Vajda J. ; Jamnický I. Proceedings of the 19th International Conference on Applied Physics of Condensed Matter : APCOM 2013. P. 54-57. - Bratislava : Nakladateľstvo STU Bratislava, 2013 ; International Conference on Applied Physics of Condensed Matter APCOM 2013
    Languageeng - English
    CountrySK - Slovak Republic
    Document kindrozpis článkov z periodík (rzb)
    CategoryAFD - Published papers from domestic scientific conferences
    Year2013
    article

    article

    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    2013
Number of the records: 1  

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