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RIE plasma etching of GaAs in SiCl4 and CCl4 gases with different resists as etch masks
Title RIE plasma etching of GaAs in SiCl4 and CCl4 gases with different resists as etch masks Author Hrkút Pavol 1948- SAVINFO - Ústav informatiky SAV SCOPUS RID Co-authors Andok Robert 1973- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV SCOPUS RID Nemec Pavol 1975- SAVINFO - Ústav informatiky SAV SCOPUS RID Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID Matay Ladislav 1950- SAVINFO - Ústav informatiky SAV SCOPUS RID Haščík Štefan 1956 SAVELEK - Elektrotechnický ústav SAV Source document / Vajda J. ; Jamnický I. Proceedings of the 20th International Conference on Applied Physics of Condensed Matter : APCOM 2014. P. 312-315. - Bratislava : FEI STU, 2014 ; International Conference on Applied Physics of Condensed Matter APCOM 2014 Language slo - Slovak Document kind rozpis článkov z periodík (rzb) Category AFD - Published papers from domestic scientific conferences Year 2014 
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rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2014
Number of the records: 1