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Limits to nanopatterning based on e-beam lithography
Title Limits to nanopatterning based on e-beam lithography Author Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Co-authors Glezos N. Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID Matay Ladislav 1950- SAVINFO - Ústav informatiky SAV SCOPUS RID Nemec Pavol 1975- SCOPUS RID Písečný Pavol Velessiotis Dimitrios Source document Proceedings of the 20th International Conference on Applied Physics of Condensed Matter : APCOM 2014. P. 292-295. - Bratislava : FEI STU, 2014 / Vajda J. ; Jamnický I. ; International Conference on Applied Physics of Condensed Matter APCOM 2014 Language eng - English Country SK - Slovak Republic Document kind rozpis článkov z periodík (rzb) Category AFDA - Published papers from international scientific conferences in Slovakia Year 2014 article
rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2014
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