Limits to nanopatterning based on e-beam lithography

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Title	Limits to nanopatterning based on e-beam lithography
Author	Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
Co-authors	Glezos N.
	Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID
	Matay Ladislav 1950- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID
	Nemec Pavol 1975- ^SCOPUS ^RID
	Písečný Pavol
	Velessiotis Dimitrios

Source document	Proceedings of the 20th International Conference on Applied Physics of Condensed Matter : APCOM 2014. P. 292-295. - Bratislava : FEI STU, 2014 / Vajda J. ; Jamnický I. ; International Conference on Applied Physics of Condensed Matter APCOM 2014
Language	eng - English
Country	SK - Slovak Republic
Document kind	rozpis článkov z periodík (rzb)
Category	AFDA - Published papers from international scientific conferences in Slovakia
Year	2014

article

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
2014

Number of the records: 1