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HWCD technology of silicon carbide thin films: properties

  1. TitleHWCD technology of silicon carbide thin films: properties
    Author Huran Jozef 1955 SAVELEK - Elektrotechnický ústav SAV    ORCID
    Co-authors Mikolášek M.

    Boháček Pavol 1954 SAVELEK - Elektrotechnický ústav SAV

    Kleinová Angela 1960- SAVPOLYM - Ústav polymérov SAV    ORCID

    Sasinková Vlasta 1954- SAVCHEM - Chemický ústav SAV

    Kobzev A.P.

    Sekáčová Mária 1955 SAVELEK - Elektrotechnický ústav SAV

    Arbet Juraj 1959 SAVELEK - Elektrotechnický ústav SAV

    Source document / Pudiš D. ; Lettrichová I. ; Kováč Jaroslav Jr. Proceedings of the 3th International Conference on Advances in Electronic and Photonic Technologies : ADEPT 2015 : held in Štrbské Pleso, High Tatras, Slovakia, June 1-4 2015. P. 104-107. - Žilina : Univ. Žilina, 2015
    Languageslo - Slovak
    Document kindrozpis článkov z periodík (rzb)
    CategoryAFD - Published papers from domestic scientific conferences
    Year2015
    article

    article

    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    2015
Number of the records: 1  

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