Technological tuning of the HSQ XR 1541 resist in EBDW lithography

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Title	Technological tuning of the HSQ XR 1541 resist in EBDW lithography
Author	Škriniarová Jaroslava
Co-authors	Hronec P.
	Andok Robert 1973- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID
	Nemec Pavol 1975- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID
	Schaaf P.

Co-authors	Wang D.
Source document	Pudiš D. / Lettrichová I. ; Kováč J., jr. Proceedings of ADEPT : 3rd International Conference on Advances in Electronic and Photonic Technologies. P. 218-222. - Žilina : University of Žilina, 2015 ; International Conference on Advances in Electronic and Photonic Technologies ADEPT 2015
Language	eng - English
Country	SK - Slovak Republic
Document kind	rozpis článkov z periodík (rzb)
Category	AFD - Published papers from domestic scientific conferences
Year	2015

article

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
2015

Number of the records: 1