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Interface engineered HfO2-based 3D vertical ReRAM
Title Interface engineered HfO2-based 3D vertical ReRAM Author Hudec Boris ORCID Co-authors Wang I-T. Lai W.-L. Chang C.-C. Jančovič Peter 1990 SAVELEK - Elektrotechnický ústav SAV Fröhlich Karol 1954 SAVELEK - Elektrotechnický ústav SAV ORCID Mičušík Matej 1977- SAVPOLYM - Ústav polymérov SAV ORCID Omastová Mária 1962- SAVPOLYM - Ústav polymérov SAV ORCID Hou T.-H. Source document Journal of Physics D: Applied Physics. Vol. 49 (2016), no. 215102 Language eng - English Document kind rozpis článkov z periodík (rbx) Citations WANG, Y.P. - DING, Z.J. - LIU, Q.X. - LIU, W.J. - DING, S.J. - ZHANG, D.W. Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors. In JOURNAL OF MATERIALS CHEMISTRY C. DEC 21 2016, vol. 4, no. 47, p. 11059-11066. BANERJEE, W. - LIU, M. In 2017 7TH INTERNATIONAL SYMPOSIUM ON EMBEDDED COMPUTING AND SYSTEM DESIGN (ISED). 2017. 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SEP 5 2018, vol. 10, no. 35, p. 29766-29778. KUZMICHEV, D.S. - LEBEDINSKII, Y.Y. - HWANG, C.S. - MARKEEV, A.M. Atomic Layer Deposited Oxygen-Deficient TaOx Layers for Electroforming-Free and Reliable Resistance Switching Memory. In PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS. DEC 2018, vol. 12, no. 12. WANG, Q. - NIU, G. - ROY, S. - WANG, Y.K. - ZHANG, Y.J. - WU, H.P. - ZHAI, S.J. - BAI, W. - SHI, P. - SONG, S.N.A. - SONG, Z.T. - XIE, Y.H. - YE, Z.G. - WENGER, C. - MENG, X.J. - REN, W. Interface-engineered reliable HfO2-based RRAM for synaptic simulation. In JOURNAL OF MATERIALS CHEMISTRY C. OCT 28 2019, vol. 7, no. 40, p. 12682-12687. CHEN, Q.Y. - WANG, Z.W. - YU, M.X. - FANG, Y.C. - YU, Z.Z. - YANG, Y.C. - CAI, Y.M. - HUANG, R. Thermal effect in ultra-high density 3D vertical and horizontal RRAM array. In PHYSICA SCRIPTA. APR 2019, vol. 94, no. 4. LIN, C.Y. - PAN, C.H. - CHEN, P.H. - CHANG, T.C. - TSAI, T.M. - CHEN, C.K. - LIN, Y.H. - HUANG, W.C. - LIN, C.C. - CHEN, W.C. Predicting voltage induced positive-feedback effect on dynamic reset behavior in resistance switching device. In JOURNAL OF PHYSICS D-APPLIED PHYSICS. FEB 27 2019, vol. 52, no. 9. SHIMA, H. - TAKAHASHI, M. - NAITOH, Y. - AKINAGA, H. Electrode Material Dependence of Resistance Change Behavior in Ta2O5 Resistive Analog Neuromorphic Device. In IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY. 2018, vol. 6, no. 1, p. 1220-1226. BANERJEE, Writam - LIU, Ming. Three-dimensional emerging nonvolatile memory for the high-density and neuromorphic applications. In 2017 7th International Symposium on Embedded Computing and System Design, ISED 2017, 2018-02-27, 2018-January, pp. 1-5. MUNJAL, S. - KHARE, N. Advances in resistive switching based memory devices. In JOURNAL OF PHYSICS D-APPLIED PHYSICS. ISSN 0022-3727, OCT 23 2019, vol. 52, no. 43. OU, Q.F. - XIONG, B.S. - YU, L. - WEN, J. - WANG, L. - TONG, Y. In-Memory Logic Operations and Neuromorphic Computing in Non-Volatile Random Access Memory. In MATERIALS. AUG 2020, vol. 13, no. 16. SUN, B. - RANJAN, S. - ZHOU, G. - GUO, T. - XIA, Y. - WEI, L. - ZHOU, Y. N. - WU, Y. A. Multistate resistive switching behaviors for neuromorphic computing in memristor. In MATERIALS TODAY ADVANCES, 2021, vol. 9, no., pp. ISSN 2590-0498. Dostupné na: https://doi.org/10.1016/j.mtadv.2020.100125. BILDER, C.R. - TEBBS, J.M. - MCMAHAN, C.S. Informative array testing with multiplex assays. In STATISTICS IN MEDICINE. ISSN 0277-6715, JUN 15 2021, vol. 40, no. 13, p. 3021-3034. CIANCI, Elena - SPIGA, Sabina. MOx materials by ALD method. In Metal Oxides for Non-volatile Memory: Materials, Technology and Applications, 2022-01-01, pp. 169-199. Dostupné na: https://doi.org/10.1016/B978-0-12-814629-3.00006-4. PARK, J. - KIM, T.H. - KWON, O. - ISMAIL, M. - MAHATA, C. - KIM, Y. - KIM, S. - KIM, S. Implementation of convolutional neural network and 8-bit reservoir computing in CMOS compatible VRRAM. In NANO ENERGY. ISSN 2211-2855, DEC 15 2022, vol. 104, B. Dostupné na: https://doi.org/10.1016/j.nanoen.2022.107886. PARK, J. - KIM, S. Improving endurance and reliability by optimizing the alternating voltage in Pt/ZnO/TiN RRAM. In RESULTS IN PHYSICS. ISSN 2211-3797, AUG 2022, vol. 39. Dostupné na: https://doi.org/10.1016/j.rinp.2022.105731. SEUL, H.J. - CHO, J.H. - HUR, J.S. - CHO, M.H. - CHO, M.H. - RYU, M.T. - JEONG, J.K. Improvement in carrier mobility through band-gap engineering in atomic-layer-deposited In-Ga-Zn-O stacks. In JOURNAL OF ALLOYS AND COMPOUNDS. ISSN 0925-8388, MAY 15 2022, vol. 903. Dostupné na: https://doi.org/10.1016/j.jallcom.2021.163876. YIN, Y.H. - SHEN, Y. - WANG, H. - CHEN, X. - SHAO, L. - HUA, W.Y. - WANG, J. - CUI, Y. In Situ Growth and Characterization of TiN/HfxZr1-xO2/TiN Ferroelectric Capacitors. In ACTA PHYSICO-CHIMICA SINICA. ISSN 1000-6818, MAY 15 2022, vol. 38, no. 5. Dostupné na: https://doi.org/10.3866/PKU.WHXB202006016. KINGRA, S.K. - PARMAR, V. - SURI, M. In-Memory Computation Based Mapping of Keccak-f Hash Function. In FRONTIERS IN NANOTECHNOLOGY. MAR 16 2022, vol. 4. Dostupné na: https://doi.org/10.3389/fnano.2022.841756. HUBBARD, W.A. - LODICO, J.J. - CHAN, H.L. - MECKLENBURG, M. - REGAN, B.C. Imaging Dielectric Breakdown in Valence Change Memory. In ADVANCED FUNCTIONAL MATERIALS. ISSN 1616-301X, JAN 2022, vol. 32, no. 2. Dostupné na: https://doi.org/10.1002/adfm.202102313. Category ADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2016 Registered in WOS Registered in SCOPUS Registered in CCC DOI 10.1088/0022-3727/49/21/215102 article
File name Access Size Downloaded Type License Interface engineered HfO2-based 3D vertical ReRAM.pdf Neprístupný/archív 2.2 MB 1 Publisher's version rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2016 2015 2.772 Q1 0.886 Q1
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