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Investigation of the AZ 5214E photoresist by the laser interference, EBDW and NSOM lithographies
Title Investigation of the AZ 5214E photoresist by the laser interference, EBDW and NSOM lithographies Author Škriniarová Jaroslava Co-authors Pudiš D. Andok Robert 1973- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Lettrichová I. Uherek F. Source document Applied Surface Science. Vol. 395 (2017), p. 226-231 Language eng - English Document kind rozpis článkov z periodík (rbx) Citations TOBING, Landobasa Y. M. - MUELLER, Aaron D. - TONG, Jinchao - ZHANG, Dao Hua. Nanobridges formed through electron beam image reversal lithography for plasmonic mid-infrared resonators with high aspect ratio nanogaps. In NANOTECHNOLOGY. ISSN 0957-4484, 2019, vol. 30, no. 42, pp. DAUD, Nurulhaidah - RAZAK, Nor Farhah - ABD RAHMAN, Normahirah Nek - ZAHIDI, Azizah Mohd - CHIN, Siew Xian - MUDA, Tengku Elmi Azlina Tengku - SYONO, Mohd Ismahadi. Image Reversal Resist Photolithography of Silicon-Based Platinum and Silver Microelectrode Pattern. In SAINS MALAYSIANA. ISSN 0126-6039, 2021, vol. 50, no. 2, pp. 515-523. LIANG WENYAO - YANG JIAQI - LI ZHIYUAN. Numerical Simulation on Fabricating Compound Photonic Crystals by Multi-Beam Holographic Interferometry. In ACTA OPTICA SINICA. ISSN 0253-2239, 2021, vol. 41, no. 11, pp. Dostupné na: https://doi.org/10.3788/AOS202141.1116002. WANG, Xuewen - YUAN, Jinpeng - WANG, Lirong - XIAO, Liantuan - JIA, Suotang. Enhanced frequency up-conversion based on four-wave mixing assisted by a Bessel-Gaussian beam in Rb-85 atoms. In OPTICS AND LASER TECHNOLOGY, 2022, vol. 149, no., pp. ISSN 0030-3992. Dostupné na: https://doi.org/10.1016/j.optlastec.2022.107874. XU, Guo-Juan - LI, Qian-Hua - CHENG, Chang - ZOU, Rong - LI, Xiao-Jie - MA, Ren-De - CAO, Hong-Zhong. Two-photon nanolithography of positive photoresist of AZ 5214E with a spatial resolution at nanoscale. In JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, 2023, vol. 22, no. 1, pp. ISSN 1932-5150. Dostupné na: https://doi.org/10.1117/1.JMM.22.1.013001. YU, K.C. - TIAN, H. - LI, R. - HAO, L.Z. - ZHANG, K.M. - ZHU, X.D. - MA, Y.Q. - MA, L. Electron-Beam Direct Writing-Based High-Performance Graphene Electrode Fabrication. In ACS APPLIED ELECTRONIC MATERIALS. SEP 5 2023, vol. 5, no. 9, p. 5187-5192. Dostupné na: https://doi.org/10.1021/acsaelm.3c00917. Category ADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2017 Registered in WOS Registered in SCOPUS Registered in CCC DOI 10.1016/j.apsusc.2016.06.141 
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File name Access Size Downloaded Type License Investigation of the AZ 5214E photoresist by the laser interference, EBDW and NSOM lithographies.pdf Neprístupný/archív 1.8 MB 1 Publisher's version rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2017 2016 3.387 Q1 0.958 Q1
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