Effect of HCN passivation on silicon oxide thin layer

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Title	Effect of HCN passivation on silicon oxide thin layer
Author	Kopani M. Pinčík Emil 1956 SAVFYZIK - Fyzikálny ústav SAV ^ORCID

Co-authors	Mikula M. Kobayashi H. Takahashi M.
Source document	Journal of the Chinese Advanced Materials Society. Vol. 5, no. 1 (2017), p. 57-64
Language	eng - English
Country	CN - China
Document kind	rozpis článkov z periodík (rbx)
Category	ADEB - Scientific papers in other foreign journals not registered in Current Contents Connect without IF (non-impacted)
Category of document (from 2022)	V3 - Vedecký výstup publikačnej činnosti z časopisu
Type of document	článok
Year	2017
DOI	10.1080/22243682.2016.1256792

article

rok	CC	IF	IF Q (best)	JCR Av Jour IF Perc	SJR	SJR Q (best)	CiteScore
	N

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
2017

Number of the records: 1