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Atomic layer deposition and properties of mixed Ta2O5 ZrO2 films
Title Atomic layer deposition and properties of mixed Ta2O5 ZrO2 films Author Kukli K. Co-authors Kemeli M. Vehkamäki M. Heikkilä M.J. Mizohata K. Kalam K. Ritala M. Leskelä M. Kundrata Ivan SAVELEK - Elektrotechnický ústav SAV Fröhlich Karol 1954 SAVELEK - Elektrotechnický ústav SAV ORCID Source document AIP Advances. Vol. 7 (2017), no. 025001 Language eng - English Document kind rozpis článkov z periodík (rbx) Citations JIANG, H. - STEWART, D.A. In ACS APPLIED MATERIALS & INTERFACES. MAY 17 2017, vol. 9, no. 19, p. 16296-16304. LEHNINGER, D. - RAFAJA, D. - WUNSCHE, J. - SCHNEIDER, F. - VON BORANY, J. - HEITMANN, J. In APPLIED PHYSICS LETTERS. JUN 26 2017, vol. 110, no. 26. ALKHAYATT, A.H.O. - HUSSAIN, S.A. - MANDI, E.A. An investigation in to the impact of Ti doping on the structural, optical and sensing properties of spray deposited nanocrystalline ZrO2 thin films. In OPTIK. 2018, vol. 159, p. 305-314. JIANG, S. - YANG, X. - ZHANG, J.H. - LI, X.F. Solution-processed stacked TiO2 and Al2O3 dielectric layers for high mobility thin film transistor. In AIP ADVANCES. AUG 2018, vol. 8, no. 8. LI, Junpeng - WU, Jianzhuo - LIU, Junqing - SUN, Jiaming. Effect of Composition, Interface, and Deposition Sequence on Electrical Properties of Nanolayered Ta2O5-Al2O3 Films Grown on Silicon by Atomic Layer Deposition. In NANOSCALE RESEARCH LETTERS. ISSN 1931-7573, 2019, vol. 14, no., pp. MACKUS, Adriaan J. M. - SCHNEIDER, Joel R. - MACISAAC, Callisto - BAKER, Jon G. - BENT, Stacey F. Synthesis of Doped, Ternary, and Quaternary Materials by Atomic Layer Deposition: A Review. In CHEMISTRY OF MATERIALS. ISSN 0897-4756, 2019, vol. 31, no. 4, pp. 1142-1183. BAEK, Gwangho - YANG, Seungmo - KIM, Taeyoon. Influence of deposition pressure of CuTe electrode on the tantalum oxide-based resistive switching memory. In MICROELECTRONIC ENGINEERING. ISSN 0167-9317, 2019, vol. 215, no., pp. ANDERSON, Erik C. - COLA, Baratunde A. Photon-Assisted Tunneling in Carbon Nanotube Optical Rectennas: Characterization and Modeling. In ACS APPLIED ELECTRONIC MATERIALS. ISSN 2637-6113, 2019, vol. 1, no. 5, pp. 692-700. QIN, Guoxuan - PEI, Zhihui - ZHANG, Yibo - LAN, Kuibo - LI, Quanning - LI, Lingxia - YU, Shihui - CHEN, Xuejiao. Dielectric ceramics/TiO2/single-crystalline silicon nanomembrane heterostructure for high performance flexible thin-film transistors on plastic substrates. In RSC ADVANCES, 2019, vol. 9, no. 60, pp. 35289-35296. BHANU, J.U. - THANGADURAI, P. Surface analysis, gate leakage currents and electrical characteristics of Mn ions incorporated into ZrO2 gate dielectric layer in silicon MOS capacitors. In MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. ISSN 1369-8001, NOV 15 2020, vol. 119. VITALE, S.A. - HU, W.L. - D'ONOFRIO, R. - SOARES, T. - GEIS, M.W. Interface State Reduction by Plasma-Enhanced Atomic Layer Deposition of Homogeneous Ternary Oxides. In ACS APPLIED MATERIALS & INTERFACES. ISSN 1944-8244, SEP 23 2020, vol. 12, no. 38, p. 43250-43256. MUNESHWAR, Triratna - BARLAGE, Doug - CADIEN, Ken. Stoichiometry controlled homogeneous ternary oxide growth in showerhead atomic layer deposition reactor and application for ZrxHf1-xO2. In JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2021, vol. 39, no. 3, pp. ISSN 0734-2101. Dostupné na: https://doi.org/10.1116/6.0000856. CAI, Chengxuan - WEI, Shengsheng - YIN, Zhipeng - BAI, Jiao - XIE, Weiwei - LI, Yue - QIN, Fuwen - SU, Yan - WANG, Dejun. Oxygen vacancy formation and uniformity of conductive filaments in Si-doped Ta2O5 RRAM. In APPLIED SURFACE SCIENCE, 2021, vol. 560, no., pp. ISSN 0169-4332. Dostupné na: https://doi.org/10.1016/j.apsusc.2021.149960. FEDOROV, Pavel - NAZAROV, Denis - MEDVEDEV, Oleg - KOSHTYAL, Yury - RUMYANTSEV, Aleksander - TOLMACHEV, Vladimir - POPOVICH, Anatoly - MAXIMOV, Maxim Yu. Plasma Enhanced Atomic Layer Deposition of Tantalum (V) Oxide. In COATINGS, 2021, vol. 11, no. 10, pp. Dostupné na: https://doi.org/10.3390/coatings11101206. SOSNOV, E. A. - MALKOV, A. A. - MALYGIN, A. A. Nanotechnology of Molecular Layering in Production of Inorganic and Hybrid Materials for Various Functional Purposes: II. Molecular Layering Technology and Prospects for Its Commercialization and Development in the XXI Century. In RUSSIAN JOURNAL OF APPLIED CHEMISTRY, 2021, vol. 94, no. 9, pp. 1189-1215. ISSN 1070-4272. Dostupné na: https://doi.org/10.1134/S1070427221090020. MALODE, Shweta J. - SHETTI, Nagaraj P. ZrOinf2/inf in biomedical applications. In Metal Oxides for Biomedical and Biosensor Applications, 2021-12-03, pp. 471-501. Dostupné na: https://doi.org/10.1016/B978-0-12-823033-6.00016-8. GURYLEV, V. A review on the development and advancement of Ta2O5 as a promising photocatalyst. In MATERIALS TODAY SUSTAINABILITY. ISSN 2589-2347, JUN 2022, vol. 18. Dostupné na: https://doi.org/10.1016/j.mtsust.2022.100131. PHAM, P.V. - BODEPUDI, S.C. - SHEHZAD, K. - LIU, Y. - XU, Y. - YU, B. - DUAN, X.F. 2D Heterostructures for Ubiquitous Electronics and Optoelectronics: Principles, Opportunities, and Challenges. In CHEMICAL REVIEWS. ISSN 0009-2665, MAR 23 2022, vol. 122, no. 6, p. 6514-6613. Dostupné na: https://doi.org/10.1021/acs.chemrev.1c00735. Keeney, L., Povey, I.M.: Vapor Phase Growth of Metal-Oxide Thin Films and Nanostructures In Tailored Functional Oxide Nanomaterials: From Design to Multi-Purpose Applications. Elsevier 2022. ISBN 978-352782694-0. Al Amin, S.M., Gulshan, F., Zubair, M.A.: Stabilisation of Cubic ZrO2 Thin Films Synthesized by Spray Pyrolysis: Influence of Cu Doping on Structural and Optical Properties In 5th IEEE International Conference on Telecommunications and Photonics, ICTP 2023 - e-Proceedings Singh, E.R., Moirangthem, B., Singh, N.K.: Study on Structural and Optical Properties of Ta2O5 Nanocluster In Springer Proceedings in Materials 25, (2023) pp. 97-102 Category ADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2017 Registered in WOS Registered in SCOPUS Registered in CCC DOI 10.1063/1.4975928 
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rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2017 2016 1.568 Q3 0.957 Q1
Number of the records: 1