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Limitations of variable shaped electron beam lithography for advanced research and semiconductor applications
Title Limitations of variable shaped electron beam lithography for advanced research and semiconductor applications Author Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Co-authors Vutova Katia Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV SCOPUS RID Ritomský Adrian 1956- SAVINFO - Ústav informatiky SAV SCOPUS RID Andok Robert 1973- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Source document Proceedings of the International Spring Seminar on Electronics Technology. (2017), art. no. 8000969. - : IEEE Computer Society Language eng - English Country BG - Bulgaria Document kind rozpis článkov z periodík (rzb) Citations BRACKMANN, Varvara - FRIEDRICH, Michael - BROWNING, Clyde - HANISCH, Norbert - UHLIG, Benjamin. Influence of the dose assignment and fracturing type on patterns exposed by a variable shaped e-beam writer: simulation vs experiment. In 35TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE (EMLC 2019). ISSN 0277-786X, 2019, vol. 11177, no., pp. HART’ANSKÝ, R. - HRICKO, J. - MIERKA, M. - HALGOŠ, J. - DZURIŠ, M. MEMS sensor of force. In Russian Journal of Nonlinear Dynamics. ISSN 26585324, 2020-01-01, 16, 1, pp. 85-92. Dostupné na: https://doi.org/10.20537/nd200107. PAJOROVA, Eva - HLUCHY, Ladislav. 3D SEM Based Functional Nanostructure for Medical Imaging. In ADVANCES IN HUMAN FACTORS AND ERGONOMICS IN HEALTHCARE AND MEDICAL DEVICES (AHFE 2021), 2021, vol. 263, no., pp. 173-179. ISSN 2367-3370. Dostupné na: https://doi.org/10.1007/978-3-030-80744-3_22. Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2017 Registered in WOS Registered in SCOPUS DOI 10.1109/ISSE.2017.8000969 
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