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Polarization-engineered n+GaN/InGaN/AlGaN/GaN normally-off MOS HEMTs

  1. TitlePolarization-engineered n+GaN/InGaN/AlGaN/GaN normally-off MOS HEMTs
    Author Gregušová Dagmar 1958 SAVELEK - Elektrotechnický ústav SAV    ORCID
    Co-authors Blaho Michal 1983 SAVELEK - Elektrotechnický ústav SAV

    Haščík Štefan 1956 SAVELEK - Elektrotechnický ústav SAV

    Šichman Peter SAVELEK - Elektrotechnický ústav SAV

    Laurenčíková Agáta 1983 SAVELEK - Elektrotechnický ústav SAV    ORCID

    Seifertová Alena 1958 SAVELEK - Elektrotechnický ústav SAV

    Dérer Ján 1948 SAVELEK - Elektrotechnický ústav SAV

    Brunner F.

    Würfl H.-J.

    Kuzmík Ján 1960 SAVELEK - Elektrotechnický ústav SAV    ORCID

    Source document Physica Status Solidi A : applications and materials science. Vol. 214 (2017), no. 1700407
    Languageeng - English
    Document kindrozpis článkov z periodík (rbx)
    CitationsTAPAJNA, M. Current Understanding of Bias-Temperature Instabilities in GaN MIS Transistors for Power Switching Applications. In CRYSTALS. ISSN 2073-4352, DEC 2020, vol. 10, no. 12.
    TOKUDA, H. - ASUBAR, J.T. - KUZUHARA, M. Design considerations for normally-off operation in Schottky gate p-GaN/AlGaN/GaN HEMTs. In JAPANESE JOURNAL OF APPLIED PHYSICS. ISSN 0021-4922, AUG 1 2020, vol. 59, no. 8.
    BISWAS, D. - TSUBOI, T. - EGAWA, T. GaN/InGaN double quantum well (DQW) gate structure for GaN-on-Si based normally-off AlGaN/GaN high electron mobility transistors (HEMTs). In MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. ISSN 1369-8001, NOV 15 2021, vol. 135.
    LI, J.L. - YIN, Y. - ZENG, N. - LIAO, F.B. - LIAN, M.X. - ZHANG, X.C. - ZHANG, K.M. - LI, J.B. Normally-off AlGaN/AlN/GaN HEMT with a composite recessed gate. In SUPERLATTICES AND MICROSTRUCTURES. ISSN 0749-6036, JAN 2022, vol. 161. Dostupné na: https://doi.org/10.1016/j.spmi.2021.107064.
    CategoryADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted)
    Category of document (from 2022)V3 - Vedecký výstup publikačnej činnosti z časopisu
    Type of documentčlánok
    Year2017
    Registered inWOS
    Registered inSCOPUS
    Registered inCCC
    DOI 10.1002/pssa.201700407
    article

    article

    rokCCIFIF Q (best)JCR Av Jour IF PercSJRSJR Q (best)CiteScore
    A
    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    201720161.775Q20.694Q1
Number of the records: 1  

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