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Electron beam energy deposition and resist profile modeling during electron beam lithography process
Title Electron beam energy deposition and resist profile modeling during electron beam lithography process Author Cvetkov Kristian Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Koleva Elena Vutova Katia Co-authors Gerasimov Vladislav Asparuhova Boriana Source document International scientific conference High technologies. business. Society : Proceedings, Volume I "High technologies". Vol. II, no. 1 (2018), p. 124-127. - Sofia, Bulgaria : Scientific Technical Union of Mechanical Engineering Industry 4.0 Language eng - English Country BG - Bulgaria Document kind rozpis článkov z periodík (rzb) Category AFC - Published papers from foreign scientific conferences Year 2018 article
rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2018
Number of the records: 1