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Characterization of MIS photoanode with a thin SiO2 layer for photoelectrochemical water splitting

  1. TitleCharacterization of MIS photoanode with a thin SiO2 layer for photoelectrochemical water splitting
    Author Chymo F.
    Co-authors Fröhlich Karol 1954 SAVCEMEA ; SAVELEK - Centrum pre využitie pokročilých materiálov SAV    ORCID

    Kundrata Ivan SAVCEMEA ; SAVELEK - Centrum pre využitie pokročilých materiálov SAV

    Hušeková Kristína 1957 SAVCEMEA ; SAVELEK - Centrum pre využitie pokročilých materiálov SAV

    Harmatha L.

    Racko J.

    Breza J.

    Mikolášek M.

    Source document AIP Conference Proceedings : Applied Physics of Condensed Matter (APCOM 2019). Vol. 2131 (2019), no. 020020
    Languageeng - English
    Document kindrozpis článkov z periodík (rbx)
    CitationsPASTUKHOVA, Nadiia - MAVRIC, Andraz - LI, Yanbo. Atomic Layer Deposition for the Photoelectrochemical Applications. In ADVANCED MATERIALS INTERFACES, 2021, vol. 8, no. 7, pp. ISSN 2196-7350. Dostupné na: https://doi.org/10.1002/admi.202002100.
    CategoryADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus
    Category of document (from 2022)V3 - Vedecký výstup publikačnej činnosti z časopisu
    Type of documentčlánok
    Year2019
    Registered inWOS
    Registered inSCOPUS
    DOI 10.1063/1.5119473
    article

    article

    rokCCIFIF Q (best)JCR Av Jour IF PercSJRSJR Q (best)CiteScore
    N
    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    201920180.182
Number of the records: 1  

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