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Characterization of MIS photoanode with a thin SiO2 layer for photoelectrochemical water splitting
Title Characterization of MIS photoanode with a thin SiO2 layer for photoelectrochemical water splitting Author Chymo F. Co-authors Fröhlich Karol 1954 SAVCEMEA ; SAVELEK - Centrum pre využitie pokročilých materiálov SAV ORCID Kundrata Ivan SAVCEMEA ; SAVELEK - Centrum pre využitie pokročilých materiálov SAV Hušeková Kristína 1957 SAVCEMEA ; SAVELEK - Centrum pre využitie pokročilých materiálov SAV Harmatha L. Racko J. Breza J. Mikolášek M. Source document AIP Conference Proceedings : Applied Physics of Condensed Matter (APCOM 2019). Vol. 2131 (2019), no. 020020 Language eng - English Document kind rozpis článkov z periodík (rbx) Citations PASTUKHOVA, Nadiia - MAVRIC, Andraz - LI, Yanbo. Atomic Layer Deposition for the Photoelectrochemical Applications. In ADVANCED MATERIALS INTERFACES, 2021, vol. 8, no. 7, pp. ISSN 2196-7350. Dostupné na: https://doi.org/10.1002/admi.202002100. Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2019 Registered in WOS Registered in SCOPUS DOI 10.1063/1.5119473 article
rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore N rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2019 2018 0.182
Number of the records: 1