Nonsymmetrical modified chemical vapor deposition (N-MCVD) process

Number of the records: 1

Title	Nonsymmetrical modified chemical vapor deposition (N-MCVD) process
Author	Doupovec Juraj 1938 SAVFYZIK - Fyzikálny ústav SAV
Co-authors	Yarin A. L.
Source document	Journal of Lightwave Technology. Vol. 9, no. 6 (1991), p. 695-700
Language	eng - English
Document kind	rozpis článkov z periodík (rbx)
Citations	BANG, Boo-Hyoung - KIM, Yong-Il - JEONG, Seokgyu - YOON, Youngbin - YARIN, Alexander L. - YOON, Sam S. Theoretical model for swirling thin film flows inside nozzles with converging-diverging shapes. In APPLIED MATHEMATICAL MODELLING. ISSN 0307-904X, 2019, vol. 76, no., pp. 607-616.
Category	ADMA - Scientific papers in foreign impacted journals registered in Web of Sciences or Scopus
Category of document (from 2022)	V3 - Vedecký výstup publikačnej činnosti z časopisu
Type of document	článok
Year	1991
Registered in	WOS
Registered in	SCOPUS
DOI	10.1109/50.81970

article

rok	CC	IF	IF Q (best)	JCR Av Jour IF Perc	SJR	SJR Q (best)	CiteScore
	N

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
1991

Number of the records: 1