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Oxygen-tolerant photo-controlled ATR-PISA in flow reactors - New polymerization set-up

  1. TitleOxygen-tolerant photo-controlled ATR-PISA in flow reactors - New polymerization set-up
    Author Bondarev Dmitrij 1977- SAVPOLYM - Ústav polymérov SAV
    Co-authors Mosnáček Jaroslav 1975- SAVPOLYM - Ústav polymérov SAV    ORCID

    Source document VESPS 2021 : Virtual European Symposium of Photopolymer Science dedicated to Ewa Andrzejewska : book of abstracts. P. 137. - Gumpoldskirchen, Austria : ChemIT e.U. - Book-of-abstracts.com, 2021 / Krebs Heinz A. ; VESP 2021 Virtual European Symposium of Photopolymer Science dedicated to Ewa Andrzejewska
    Languageeng - English
    URLvesps2021.net
    Document kindrozpis článkov z periodík (rzb)
    CategoryAFG - Abstracts of papers from foreign conferences
    Year2021
    article

    article

    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    2021
Number of the records: 1  

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