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Local increase in compressive strain (GaN) in gate recessed AlGaN/GaN MISHFET structures induced by an amorphous AlN dielectric layer
Title Local increase in compressive strain (GaN) in gate recessed AlGaN/GaN MISHFET structures induced by an amorphous AlN dielectric layer Author Mikulics M. Co-authors Kordoš Peter SAVELEK - Elektrotechnický ústav SAV Gregušová Dagmar 1958 SAVELEK - Elektrotechnický ústav SAV ORCID Gaži Štefan 1948 SAVELEK - Elektrotechnický ústav SAV Novák Jozef 1951 SAVELEK - Elektrotechnický ústav SAV Sofer Z. Mayer J. Hartdegen H. Source document Semiconductor Science and Technology. Vol. 36 (2021), no. 095040 Language eng - English Document kind rozpis článkov z periodík (rbx) Citations BHARDWAJ, N. - UPADHYAY, B.B. - YADAV, Y.K. - SURAPANENI, S. - GANGULY, S. - SAHA, D. Thermally grown Nb-oxide for GaN-based MOS-diodes. In APPLIED SURFACE SCIENCE. ISSN 0169-4332, JAN 15 2022, vol. 572. Dostupné na: https://doi.org/10.1016/j.apsusc.2021.151332. Liu, Y., Chen, S., Cheng, Z., Wang, T., Huang, C., Jiang, G., Zhang, H., Cai, Y.: Temperature dependence of the strain of the AlGaN barrier layer under the gate in AlGaN/AlN/GaN HFETs In Micro and NanostructuresVolume 164 (2022) Article number 107160. HUANG, J.H. - LIU, W. - CHENG, X. - MIRANDA, A. - DWIR, B. - RUDRA, A. - KAPON, E. - WONG, C.W. Single site-controlled inverted pyramidal InGaAs QD-nanocavity operating at the onset of the strong coupling regime. In JOURNAL OF APPLIED PHYSICS. ISSN 0021-8979, DEC 14 2023, vol. 134, no. 22. Dostupné na: https://doi.org/10.1063/5.0175055. Category ADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2021 Registered in WOS Registered in SCOPUS Registered in CCC DOI 10.1088/1361-6641/ac1a28 article
File name Access Size Downloaded Type License Local increase in compressive strain (GaN) in gate recessed AlGaNGaN MISHFET structures induced by an amorphous AlN dielectric layer.pdf available 2.7 MB 0 Publisher's version rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2021 2020 2.352 Q3 0.712 Q1
Number of the records: 1