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Dependence of PMMA electron beam resist sidewall shape on exposure dose and resist thickness
Title Dependence of PMMA electron beam resist sidewall shape on exposure dose and resist thickness Author Andok Robert 1973- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Co-authors Vutova Katia Koleva Elena Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV SCOPUS RID Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Source document AIP Conference Proceedings : Applied Physics of Condensed Matter (APCOM 2021). Vol. 2411 (2021), art. no. 040001 Language eng - English Document kind rozpis článkov z periodík (rbx) Citations CAKIRLAR, Cigdem - GALDERISI, Giulio - BEYER, Christoph - SIMON, Maik - MIKOLAJICK, Thomas - TROMMER, Jens. Challenges in Electron Beam Lithography of Silicon Nanostructures. In 2022 IEEE 22ND INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (NANO), 2022, vol., no., pp. 207-210. ISSN 1944-9399. Dostupné na: https://doi.org/10.1109/NANO54668.2022.9928629. DU, L.Q. - YUAN, B.W. - GUO, B.J. - WANG, S. - CAI, X.K. Fabrication of high-aspect-ratio stepped Cu microcolumn array using UV-LIGA technology. In MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS. ISSN 0946-7076, JUL 2023, vol. 29, no. 7, p. 999-1014. Dostupné na: https://doi.org/10.1007/s00542-023-05491-0. Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2021 Registered in SCOPUS DOI 10.1063/5.0067068 
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rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore N rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2021 2020 0.177
Number of the records: 1