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Interfacial reactions of thin iron films on silicon under amorphous silicon and SiOx capping
Title Interfacial reactions of thin iron films on silicon under amorphous silicon and SiOx capping Author Luby Štefan 1941 SAVFYZIK - Fyzikálny ústav SAV Jergel Matej 1954- SAVFYZIK - Fyzikálny ústav SAV SCOPUS RID ORCID Majková Eva 1950 SAVFYZIK - Fyzikálny ústav SAV ORCID Ožvold Milan 1954 SAVFYZIK - Fyzikálny ústav SAV Co-authors Leggieri G. Luches A. Majni G. Source document Thin Solid Films. Vol. 245, no. 1-2 (1994), p. 55-59 Language eng - English Country NL - Netherlands Citations REBIEN, M - HENRION, W - ANGERMANN, H - ROSELER, A. Ellipsometric comparison of the native oxides of silicon and semiconducting iron disilicide (beta-FeSi2). In SURFACE SCIENCE. ISSN 0039-6028, 2000, vol. 462, no. 1-3, pp. 143-150. ORLOWSKI, BA - KOWALSKI, BJ - FRONC, K - ZUBEREK, R - MICKEVICIUS, S - MIRABELLA, F - GHIJSEN, J. Study of Fe/Si multilayers by photoemission spectroscopy. In JOURNAL OF ALLOYS AND COMPOUNDS. ISSN 0925-8388, 2004, vol. 362, no. 1-2, pp. 202-205. Dostupné na: https://doi.org/10.1016/S0925-8388(03)00584-X. VERMA, Hina - LE GUEN, Karine - DELAUNAY, Renaud - ISMAIL, Iyas - ILAKOVAC, Vita - RUEFF, Jean Pascal - ZHENG, Yunlin Jacques - JONNARD, Philippe. Study of buried interfaces in Fe/Si multilayer by hard x-ray emission spectroscopy. In SURFACE AND INTERFACE ANALYSIS. ISSN 0142-2421, 2021, vol. 53, no. 12, pp. 1043-1047. Dostupné na: https://doi.org/10.1002/sia.7005. Category ADMA - Scientific papers in foreign impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 1994 Registered in WOS Registered in SCOPUS DOI 10.1016/0040-6090(94)90877-X 
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rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore N rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 1994 1993 1.140
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