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Optimization of electron beam lithography processing of resist AR-N 7520
Title Optimization of electron beam lithography processing of resist AR-N 7520 Author Koleva Elena Co-authors Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Koleva Lilyana Vutova Katia Markova Irina Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV SCOPUS RID Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID Andok Robert 1973- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Source document Industry 4.0. Vol. 6, no. 5 (2021), p. 189-191 Language eng - English Country BG - Bulgaria Note Vyšlo aj v zborníku: INDUSTRY 4.0 : VI International scientific conference - Winter session. Year V, vol. 2/12, p. 238-240. Document kind rozpis článkov z periodík (rbx) Citations ZHAO, R. - WANG, X. - HU, Z. - XU, H. - HE, X. Critical dimension prediction of metal oxide nanoparticle photoresists for electron beam lithography using a recurrent neural network. In Nanoscale. 2023, vol. 15, no. 33, pp. 13692-13698. Dostupné na: Dostupné na: https://doi.org/10.1039/d3nr01356a. ZHAO, Rongbo - WANG, Xiaolin - XU, Hong - WEI, Yayi - HE, Xiangming. Machine learning in electron beam lithography to boost photoresist formulation design for high-resolution patterning. In NANOSCALE, 2024, vol. 16, no. 8, pp. 4212-4218. ISSN 2040-3364. KESWANI, V.H. - PESHWE, P. - KESWANI, G. An in-depth review of models used to optimize electron beam lithography processes. In International Journal of Intelligent Systems and Applications in Engineering. ISSN 2147-6799, 2024, vol. 12, no. 13s, pp. 609-621. Category ADEB - Scientific papers in other foreign journals not registered in Current Contents Connect without IF (non-impacted) Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok z podujatia Year 2022 
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rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2021
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