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Optimization of electron beam lithography processing of resist AR-N 7520

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    article

    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    2021
    Hušeková Kristína 1957 SAVELEK - Elektrotechnický ústav SAV Ondrejka P. Kemeny M. Hotový I. Mikolášek M.
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