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Interfacial reactions and critical current density of Cu-sheathed Cu-doped MgB2 wire with Ti diffusion barrier

  1. TitleInterfacial reactions and critical current density of Cu-sheathed Cu-doped MgB2 wire with Ti diffusion barrier
    Author Srivastava N.
    Co-authors Mehrotra S.

    Búran Marek SAVELEK - Elektrotechnický ústav SAV    ORCID

    Hušek Imrich 1958 SAVELEK - Elektrotechnický ústav SAV

    Sharma D.

    Kováč Pavol 1952 SAVELEK - Elektrotechnický ústav SAV    ORCID

    Santra S.

    Source document Journal of Alloys and Compounds. Vol. 966 (2023), no. 171657
    Languageeng - English
    CountryCH - Switzerland
    Document kindrozpis článkov z periodík (rbx)
    CategoryADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted)
    Category of document (from 2022)V3 - Vedecký výstup publikačnej činnosti z časopisu
    Type of documentčlánok
    Year2023
    Registered inWOS
    Registered inSCOPUS
    Registered inCCC
    DOI 10.1016/j.jallcom.2023.171657
    article

    article

    File nameAccessSizeDownloadedTypeLicense
    Interfacial reactions and critical current density of Cu-sheathed Cu-doped.pdfNeprístupný/archív10.1 MB0Publisher's version
    rokCCIFIF Q (best)JCR Av Jour IF PercSJRSJR Q (best)CiteScore
    A
    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    202320226.2Q10.678Q1
Number of the records: 1  

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