Study of lithographic parameters for the trilayer resist systems in electron beam lithography

Number of the records: 1

Title	Study of lithographic parameters for the trilayer resist systems in electron beam lithography
Author	Andok Robert 1973- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
Co-authors	Vutova Katia
	Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID
	Ritomský Mário 1993- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
	Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID

Source document	AIP Conference Proceedings. Vol. 2778 (2023), art. no. 030001
Language	eng - English
Country	US - United States of America
Document kind	rozpis článkov z periodík (rbx)
Category	ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus
Category of document (from 2022)	V3 - Vedecký výstup publikačnej činnosti z časopisu
Type of document	článok
Year	2023
Registered in	WOS
Registered in	SCOPUS
DOI	10.1063/5.0136258

article

rok	CC	IF	IF Q (best)	JCR Av Jour IF Perc	SJR	SJR Q (best)	CiteScore
	N

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
2023	2022			0.164

Number of the records: 1