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Optimisation criteria for the process electron beam lithography of negative AR-N7520 resists

  1. TitleOptimisation criteria for the process electron beam lithography of negative AR-N7520 resists
    Author Koleva Elena
    Co-authors Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV    SCOPUS    RID    ORCID

    Andok Robert 1973- SAVINFO - Ústav informatiky SAV    SCOPUS    RID    ORCID

    Vutova Katia

    Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV    SCOPUS    RID

    Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV    SCOPUS    RID

    Source document Journal of Physics: Conference Series. Vol. 2443, no. 1 (2023), art. no. 012007
    Languageeng - English
    Document kindrozpis článkov z periodík (rbx)
    CategoryADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus
    Category of document (from 2022)V3 - Vedecký výstup publikačnej činnosti z časopisu
    Type of documentčlánok
    Year2023
    Registered inSCOPUS
    DOI 10.1088/1742-6596/2443/1/012007
    article

    article

    rokCCIFIF Q (best)JCR Av Jour IF PercSJRSJR Q (best)CiteScore
    N
    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    202320220.183
Number of the records: 1  

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