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Optimisation criteria for the process electron beam lithography of negative AR-N7520 resists
Title Optimisation criteria for the process electron beam lithography of negative AR-N7520 resists Author Koleva Elena Co-authors Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Andok Robert 1973- SAVINFO - Ústav informatiky SAV SCOPUS RID ORCID Vutova Katia Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV SCOPUS RID Konečníková Anna 1955- SAVINFO - Ústav informatiky SAV SCOPUS RID Source document Journal of Physics: Conference Series. Vol. 2443, no. 1 (2023), art. no. 012007 Language eng - English Document kind rozpis článkov z periodík (rbx) Category ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus Category of document (from 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Type of document článok Year 2023 Registered in SCOPUS DOI 10.1088/1742-6596/2443/1/012007 article
rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore N rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2023 2022 0.183
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