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Polyimide application for fabrication of open stencil mask (OSM) with high resolution for new generation lithography
Title Polyimide application for fabrication of open stencil mask (OSM) with high resolution for new generation lithography : Technical report II-TR-SAS-LM-2006-01 Author Matay Ladislav 1950- SAVINFO - Ústav informatiky SAV SCOPUS RID Issue data Bratislava : Institute of Informatics Slovak Academy of Sciences , 2006 Language eng - English Country SK - Slovak Republic Document kind knihy Category GAI - Reports Year 2006 
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Number of the records: 1