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Plasma enhanced chemical vapor deposition of low-k a-SiC:H thin films:FTIR study of chemical bonding
Title Plasma enhanced chemical vapor deposition of low-k a-SiC:H thin films:FTIR study of chemical bonding Author Huran Jozef 1955 SAVELEK - Elektrotechnický ústav SAV ORCID Co-authors Kleinová Angela 1960- SAVPOLYM - Ústav polymérov SAV ORCID Sasinková Vlasta 1954- SAVCHEM - Chemický ústav SAV Kobzev A.P. Boháček Pavol 1954 SAVELEK - Elektrotechnický ústav SAV Sekáčová Mária 1955 SAVELEK - Elektrotechnický ústav SAV Arbet Juraj 1959 SAVELEK - Elektrotechnický ústav SAV Source document / Pudiš D. ; Šušlík Ľ. ; Kováč J., jr. ; Flickyngerová S. ; Lettrichová I. Proceedings of ADEPT : 2nd International Conference on Advances in Electronic and Photonic Technologies. P. 168-171. - Žilina : University of Žilina, 2014 ; International Conference on Advances in Electronic and Photonic Technologies ADEPT 2014 Language slo - Slovak Document kind rozpis článkov z periodík (rzb) Category AFD - Published papers from domestic scientific conferences Year 2014 
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rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2014
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