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Interface engineered HfO2-based 3D vertical ReRAM

  1. TitleInterface engineered HfO2-based 3D vertical ReRAM
    Author Hudec Boris    ORCID
    Co-authors Wang I-T.

    Lai W.-L.

    Chang C.-C.

    Jančovič Peter 1990 SAVELEK - Elektrotechnický ústav SAV

    Fröhlich Karol 1954 SAVELEK - Elektrotechnický ústav SAV    ORCID

    Mičušík Matej 1977- SAVPOLYM - Ústav polymérov SAV    ORCID

    Omastová Mária 1962- SAVPOLYM - Ústav polymérov SAV    ORCID

    Hou T.-H.

    Source document Journal of Physics D: Applied Physics. Vol. 49 (2016), no. 215102
    Languageeng - English
    Document kindrozpis článkov z periodík (rbx)
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    A. Azuma, R. Nakajima, H. Yoshida, T. Shimizu, T. Ito, and S. Shingubara Voltage Pulse Induced Resistance Change Response of ReRAM with HfO2 Layer IN ECS Trans, 2018, vol. 76, p. 13-21.
    BANERJEE, W. - LU, N.D. - YANG, Y. - LI, L. - LV, H.B. - LIU, Q. - LONG, S.B. - LIU, M. Investigation of Retention Behavior of TiOx/Al2O3 Resistive Memory and Its Failure Mechanism Based on Meyer-Neldel Rule. In IEEE TRANSACTIONS ON ELECTRON DEVICES. MAR 2018, vol. 65, no. 3, p. 957-962.
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    WANG, Q. - NIU, G. - ROY, S. - WANG, Y.K. - ZHANG, Y.J. - WU, H.P. - ZHAI, S.J. - BAI, W. - SHI, P. - SONG, S.N.A. - SONG, Z.T. - XIE, Y.H. - YE, Z.G. - WENGER, C. - MENG, X.J. - REN, W. Interface-engineered reliable HfO2-based RRAM for synaptic simulation. In JOURNAL OF MATERIALS CHEMISTRY C. OCT 28 2019, vol. 7, no. 40, p. 12682-12687.
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    CategoryADCA - Scientific papers in foreign journals registered in Current Contents Connect with IF (impacted)
    Category of document (from 2022)V3 - Vedecký výstup publikačnej činnosti z časopisu
    Type of documentčlánok
    Year2016
    Registered inWOS
    Registered inSCOPUS
    Registered inCCC
    DOI 10.1088/0022-3727/49/21/215102
    article

    article

    File nameAccessSizeDownloadedTypeLicense
    Interface engineered HfO2-based 3D vertical ReRAM.pdfNeprístupný/archív2.2 MB1Publisher's version
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    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    201620152.772Q10.886Q1
Number of the records: 1  

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