PMMA resist profile and proximity effect dependence on the electron-beam lithography process parameters

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Title	PMMA resist profile and proximity effect dependence on the electron-beam lithography process parameters
Author	Kostič Ivan 1955- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID ^ORCID
Co-authors	Vutova Katia
	Koleva Elena
	Benčurová Anna 1966- SAVINFO - Ústav informatiky SAV ^SCOPUS ^RID

Source document	Journal of Physics: Conference Series. Vol. 1492 (2020), art. no. 012015
Language	eng - English
Document kind	rozpis článkov z periodík (rbx)
Citations	LIU, Qing - CHEN, Yiqin - FENG, Zhanyong - SHU, Zhiwen - DUAN, Huigao. Resist nanokirigami for multipurpose patterning. In NATIONAL SCIENCE REVIEW, 2022, vol. 9, no. 11, pp. ISSN 2095-5138. Dostupné na: https://doi.org/10.1093/nsr/nwab231.
	ZHENG YU - GAO PIAO-PIAO - TANG XIN - LIU JIAN-ZHE - DUAN JI-AN. Effects of electron beam lithography process parameters on structure of silicon optical waveguide based on SOI. In JOURNAL OF CENTRAL SOUTH UNIVERSITY, 2022, vol. 29, no. 10, pp. 3335-3345. ISSN 2095-2899. Dostupné na: https://doi.org/10.1007/s11771-022-5152-0.
Category	ADMB - Scientific papers in foreign non-impacted journals registered in Web of Sciences or Scopus
Category of document (from 2022)	V3 - Vedecký výstup publikačnej činnosti z časopisu
Type of document	článok
Year	2020
Registered in	WOS
Registered in	SCOPUS
DOI	10.1088/1742-6596/1492/1/012015

article

	File name	Access	Size	Downloaded	Type	License
	PMMA resist profile and proximity effect dependence on the electron-beam lithography process parameters.pdf	available	748.1 KB	1	Publisher's version

rok	CC	IF	IF Q (best)	JCR Av Jour IF Perc	SJR	SJR Q (best)	CiteScore
	N

rok vydania	rok metriky	IF	IF Q (best)	SJR	SJR Q (best)
2020	2019			0.227	Q3

Number of the records: 1